Nitrogen Trifluoride Nf3 Fluorine Gas F2 Market Size to Expand Significantly by the End of 2023

Major Market Players:
The leading companies in the market are DSK Hyosung, Ulsan Chemical Company Limited, OCI Materials Co, Formosa Plastics, Mitsui Chemicals Inc, Central Glass Co Ltd, KANTO DENKA KOGYO CO LTD, Navin Fluorine industries and FOOSUNG CO. LTD.

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The Global Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) is segmented as follows-

By NF3 Application:
Flat Panel Displays
Semiconductor Chips
Solar Cells

By F2 Application:
Sulfur Hexafluoride
Uranium Enrichment
Electronic Cleaning

Table of Contents:
1.Introduction
2.Executive Summary
3.Market Overview
4.Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) Market, By NF3 Application
4.1.Introduction
4.2.Global Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) Sales, Revenue and Market Share By NF3 Application (2014-2017)
4.2.1.Global Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) Sales and Sales Share By NF3 Application (2014-2017)
4.2.2.Global Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) Revenue and Revenue Share By NF3 Application (2014-2017)
4.3.Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) Market Assessment and Forecast, By NF3 Application, 2014-2023
4.4.Semiconductor Chips
4.4.1.Market Assessment and Forecast, By Region, 2014-2023 ($Million)
4.5.Flat Panel Displays
4.5.1.Market Assessment and Forecast, By Region, 2014-2023 ($Million)
4.6.Solar Cells
4.6.1.Market Assessment and Forecast, By Region, 2014-2023 ($Million)
To be Continued…

Regional Outlook and Trend Analysis:
Asia Pacific was the biggest local NF3 market and also F2 market with 43.5 percent and 45.4 percent of the aggregate demand separately. The development of semiconductor industry in Japan, South Korea and China is anticipated to increase drive NF3 market demand in the generation of semiconductors.Requirement is foreseen to be additionally increased attributable to expanding interest for flat panel displays in developing markets, for example, India and China. The expansion in atomic influence age in Australia, China and India is anticipated to help the F2 market development for uranium advancement over the estimate time frame.

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Industry Outlook and Trend Analysis:
The Nitrogen Trifluoride (NF3) & Fluorine Gas (F2) Market is expected to garner maximum market share by 2023, while registering itself at a considerable compound annual growth rate (CAGR) during the forecast period.

Nitrogen trifluoride (NF3) is a mixture that is inorganic and has non-flammable, toxic, odorless properties. NF3 is produced by the response of ammonia (NH3) and hydrochloric acid (HCL) and basically utilized as a part of the cleaning of silicon wafers in solar energy and semiconductor applications. Fluorine gas (F2) is composed either from fluorapatite or fluorite (fluorspar), utilized as a part of switchgears, uranium enhancement, and electronic cleaning applications.

Fluorine as uranium sulfur hexafluoride (SF6) and hexafluoride (UF6) are utilized for uranium advancement and as a dielectric medium for gas protected switchgears, individually.

Nuclear advancement empowers uranium for additionally preparing in power generation and different applications. Expanding uranium creation is anticipated to support the interest for UF6 in the nuclear power generation driving development in the F2 market. NF3 is considered set up of other cleaning operators, for example, hexafluoroethane, sulfur hexafluoride and per fluorocarbons because of its ecological viability. Expanding generation of solar power is foreseen to help the NF3 market interest for thin film solar cells.

Additionally, NF3 is utilized as a part of plasma preparing for manufacturing the coordinated circuits of laptops, televisions and tablets. It mostly cleans the silicon wafers at Plasma Enhanced Chemical Vapor Deposition (PECVD) in Liquid Crystal Displays (LCDs). NF3's fluorine content is utilized for cleaning the silicon-based debasements in the chamber. Consequently, expanding interest of LCD TVs is anticipated to support NF3 market interest for use in TVs.

Nonetheless, the Kyoto Protocol has perceived NF3 as the second most GWP gas after SF6 and included it in the rundown for second duty period from 2013. The implementation of Kyoto Protocol by the United States also, European nations are relied upon to confine NF3 showcase interest for various applications in the area. Furthermore, being extensively receptive and harmful to individuals in the event of immediate and prolonged exposure that can be a noteworthy inhibition for the F2 market.

Application Outlook and Trend Analysis:
NF3 is significantly utilized in the production of solar cells, semiconductor chips and flat panel displays, while, F2 is utilized as a part of electronic cleaning, uranium enrichment, and sulfur hexafluoride. In 2013 Semiconductor chip was the biggest application fragment for the NF3 market and represented 45.9 percent of aggregate request. It is fundamentally used to clean production chamber of silicon chips the semiconductor business. It is likewise utilized as a part of the cleaning of Plasma Enhanced Chemical Vapor Deposition (PECVD) chambers for the assembling of vast volumes of flat panel displays in camcorders, digital cameras, laptops, point-and-shoot cameras, pocket camcorders.

Furthermore, NF3 market applications additionally incorporate cleaning of silicon wafers in plasma upgraded concoction vapor statement (PECVD) for the creation of thin-film sunlight based cells or thin film photovoltaic cells. In 2013 Uranium enhancement was the biggest application for the F2 market. F2 is utilized as a part of the type of uranium hexafluoride (UF6) for nuclear enhancement of uranium trioxide (U3O8). Sulfur hexafluoride (SF6) is significantly utilized as a dielectric medium in electronic applications.

Alternate employments of SF6 incorporate differentiation operator for ultrasound imaging, tracer compound and packaging medium for the magnesium generation. F2 is utilized as a part of the cleaning of PECVD fabricating chamber for the generation of semiconductors. It is fundamentally utilized for cleaning silicon wafers introduce in the silicon-based semiconductors.

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